Auckland Microfab
Laser Micromachined UoA Logo
Dr. Rohde and I are in New Hampshire at JPSA (see earlier post). The image below is an example of Cr mask ablation with the excimer system we are going to soon have at the UoA (a specific date has not been set, we are hoping for late June to early July).
The top of the crest is ~500um wide and each line is created with a ~2×2 um^2 laser pulse. The light areas are reflected light from the Cr and the dark areas are where the chrome has been removed. The errors are generally ours due to file conversion strangeness, but we ought to be able to optimize the process to produce Cr masks with ~2 um features of arbitrary design.
Update: Measured the spot size at 3.5um diameter by SEM… this is not optimized, but likely close to the lower limit for features that can be patterned in Cr using the excimer.
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Affiliations
- School of Chemical Sciences
- University of Auckland Photon Factory
- University of Auckland Microscale Research Group
- Polymer Electronics Research Centre
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Links
- The MacDiarmid Foundation
- The University of Canterbury Nanofab
- Victoria University Cleanroom Facility
- Maurice Wilkins Centre
- UniServices
- Callaghan Innovation
- Ministry of Business, Innovation, and Employment
- University of Auckland Biomimetics Laboratory